PROCESS ENHANCEMENT TECHNOLOGIES

Substrate Temperature Control
Improved grain boundary migration, post process annealing, and controlling surface reactions are just a sample of the applications for substrate temperature control. For your heating or cooling applications we have several standard options as well as the ability to customize a solution for your substrate and temperature range.

Planetary Motion
Our planetary stage fixturing allows improved uniformity over a large number of substrates. Typically reserved for our Åmod and EvoVac lines, planetary fixturing can substantially increase your system throughput.

Gradient Shutter
Our gradient wedge shutter systems provide the ability to create gradient films as well as stepped films. Often custom designed these tools provide the option of manual or servo motor control and can be used as a single axis shutter or a twin axis shutter.

Biasing
If you are looking to control film density or improve adhesion, a bias may be the solution for your process. Angstrom Engineering can configure many of our stages to include a DC or RF bias.

Substrate Cleaning
In situ cleaning via ion beam or glow discharge ensures your substrate is prepared for deposition. For removal of native oxides to residual oils, consider adding a cleaning process to your system.